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Vacuum Plating Thin Film Magnetron Sputtering PVD Coating Systems

Customization: Available
Warranty: One Year
Type: Coating Production Line

Product Description

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Basic Information

Model NO.
CY-MSP300S-3RF
Coating
Vacuum Coating
Substrate
Steel
Certification
CE
Condition
New
Sample Stage
Dia. 185mm
Heating Temp
Max 500℃
Rotate Speed
1-20rpm Adjustable
Chamber Material
Stainless Steel
Production Capacity
100 pieces/Month
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Packaging & Delivery

Package Size
110.00cm * 100.00cm * 130.00cm
Gross Weight
360.000kg
Transport Package
Wooden Case
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Product Description

Vacuum Plating Thin Film Magnetron Sputtering PVD Coating Systems

🔹 Magnetron Sputtering Coater Introduction

Three targets RF magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for choice. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with three 300W RF power supplies. The RF power supply can be used for the preparation of non-metals. The three targets can meet the needs of multi-layer or multiple coatings. If customers have other coating needs, DC power supply and pulse power supply can be customized. Various types of power supply are available from 300W to 1000W in various specifications.
The coating machine is equipped with two-channel high-precision mass flowmeter. The gas path can be customized up to four-channel mass flowmeters to meet complex gas environment requirements. The instrument is equipped with advanced turbomolecular pump sets, with an ultimate vacuum up to 1.0E-5Pa. Molecular pump gas path is controlled by multiple solenoid valves, allowing users to open the chamber to take out samples without shutting down the pump, greatly improving work efficiency. This product can be equipped with an integrated industrial computer to control functions such as vacuum pump and sputtering power control.

💡 Applications

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and more. It is an ideal equipment for preparing material films in a laboratory due to its compact size and easy operation.
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Technical Parameters

Sample Stage Size: φ185mm Accuracy: ±1ºC
Heating: Max 500ºC Rotation: 1-20rpm
Target Head Quantity: 2" × 3 (1", 2" optional) Chiller: 10L/min Flow rate
Cooling: Water cooling -
Vacuum Chamber Size: φ300mm × 300mm Window: φ100mm
Material: Stainless Steel Opening: Top cover open
Vacuum System Ultimate Vacuum: 1.0E-5Pa; Molecular Pump: 600L/S; Backing Pump: Rotary vane pump
Dimensions 600mm × 650mm × 1280mm; Total Weight: 300kg; Power: 2.5KW
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Detailed Photos

Frequently Asked Questions

Q1:   Are you a manufacturer or a trading company?
We are professional laboratory instrument manufacturers with our own design team and factory, ensuring product quality and optimal pricing through mature technical experience.
Q2:   What is your after-sales service system?
The product warranty period is 12 months with lifetime maintenance provided. Our professional departments respond within 24 hours to resolve any technical issues.
Q3:   How long is the delivery time for customized instruments?
Standard goods in stock take 5-10 days. Customized services typically require 30-60 days depending on the specific technical requirements.
Q4:   How do you handle different power supply and plug standards?
We can supply appropriate transformers and plugs according to your local requirements and the power standards of different countries.
Q5:   What are the available payment methods?
We accept T/T, L/C, D/P, and other standard international payment methods. Trade guarantees are also recommended.
Q6:   How are the goods packaged and delivered?
We use standard export fumigation wooden box packaging. Delivery can be arranged via express, air, or sea shipping based on your specific needs.

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